发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: A method for manufacturing a semiconductor device is provided to improve reliability of a package product, by preventing an interlayer dielectric in a pad portion from being exposed and cracked. CONSTITUTION: A metal interconnection is formed in a central portion(A) and a pad portion(B) of a semiconductor substrate(10). An interlayer dielectric(11) is stacked on the central and pad portions. A plug(21) of a high melting metal material is formed in a via hole of the interlayer dielectric to be connected to the metal interconnection of the central portion. A pad is connected to the metal interconnection of the pad portion through an opening of the interlayer dielectric, and a metal interconnection(23a) connected to the plug is formed.
申请公布号 KR20010017176(A) 申请公布日期 2001.03.05
申请号 KR19990032555 申请日期 1999.08.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, YUN GYU;KIM, WON CHEOL
分类号 H01L21/768;(IPC1-7):H01L21/768 主分类号 H01L21/768
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