发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A method for manufacturing a semiconductor device is provided to improve reliability of a package product, by preventing an interlayer dielectric in a pad portion from being exposed and cracked. CONSTITUTION: A metal interconnection is formed in a central portion(A) and a pad portion(B) of a semiconductor substrate(10). An interlayer dielectric(11) is stacked on the central and pad portions. A plug(21) of a high melting metal material is formed in a via hole of the interlayer dielectric to be connected to the metal interconnection of the central portion. A pad is connected to the metal interconnection of the pad portion through an opening of the interlayer dielectric, and a metal interconnection(23a) connected to the plug is formed.
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申请公布号 |
KR20010017176(A) |
申请公布日期 |
2001.03.05 |
申请号 |
KR19990032555 |
申请日期 |
1999.08.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, YUN GYU;KIM, WON CHEOL |
分类号 |
H01L21/768;(IPC1-7):H01L21/768 |
主分类号 |
H01L21/768 |
代理机构 |
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主权项 |
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地址 |
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