发明名称 |
Antenna device for generating inductively coupled plasma |
摘要 |
The invention relates to an antenna device of a low impedance for generating a large quantity of inductively coupled plasma to process a large size of a specimen with adjustment for a uniform distribution in the density of plasma, comprising: a high frequency power source; a first antenna for receiving the high frequency power supplied from the high frequency power source; and a second antenna connected in parallel with the first antenna for receiving the high frequency power supplied from the high frequency power source, wherein a resonant state is kept between the first and second antennas. <IMAGE>
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申请公布号 |
EP1079671(A2) |
申请公布日期 |
2001.02.28 |
申请号 |
EP20000401460 |
申请日期 |
2000.05.25 |
申请人 |
JUSUNG ENGINEERING CO. LTD.;KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
LEE, YONG-KWAN;YOON, NAM-SIK;KIM, SUNG-SIK;LEE, PYUNG-WOO;CHANG, HONG-YOUNG |
分类号 |
H01L21/205;H01Q1/27;C23C16/507;H01J37/32;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):H05H1/46 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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