| 摘要 |
PROBLEM TO BE SOLVED: To constitute a system with lesser complexity and lower cost by providing a processing chamber with a window and a holder and by enabling energy radiation assembly to be evacuated to differentiate the pressure between outside and inside of the window. SOLUTION: This semiconductor processing system 10 comprises a semiconductor processing chamber 12, a wafer handling unit or a holding unit 14 arranged in the semiconductor processing chamber 12, and a lamp head or heat source assembly 16 located on the semiconductor processing chamber 12. The head lamp assembly 16 is located in the upper part of a window 20. A vacuum pump 68 is provided to reduce the pressure inside the lamp head assembly 16. The pressure in the lamp head assembly 16 extends through a cooling chamber 42 and is reduced by pumping through a guide pipe or a port 69 that is hydrodynamically connected to an internal spacing in one of the reflector units 40. The internal spacing inside the specific reflector unit is hydrodynamically connected to the inside of the other reflector units through a small channel 70 that extends inside the wall of the reflector units 40.
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