发明名称 Method for forming quantum dot in semiconductor device and a semiconductor device resulting therefrom
摘要 Method for forming quantum dots using agglomeration of a conductive layer and a semiconductor device resulting therefrom are disclosed. The method includes the steps of forming a first insulating layer on a substrate, forming a conductive layer on the first insulating layer, forming a second insulating layer on the conductive layer, and annealing the conductive layer between the first, and second insulating layers to agglomerate the conductive layer.
申请公布号 US6194237(B1) 申请公布日期 2001.02.27
申请号 US19980212602 申请日期 1998.12.16
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 KIM KI BUM;YOON TAE SIK;KWON JANG YEON
分类号 H01L29/06;H01L21/20;H01L21/82;H01L29/66;(IPC1-7):H01L21/00 主分类号 H01L29/06
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