发明名称 |
Method for forming quantum dot in semiconductor device and a semiconductor device resulting therefrom |
摘要 |
Method for forming quantum dots using agglomeration of a conductive layer and a semiconductor device resulting therefrom are disclosed. The method includes the steps of forming a first insulating layer on a substrate, forming a conductive layer on the first insulating layer, forming a second insulating layer on the conductive layer, and annealing the conductive layer between the first, and second insulating layers to agglomerate the conductive layer.
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申请公布号 |
US6194237(B1) |
申请公布日期 |
2001.02.27 |
申请号 |
US19980212602 |
申请日期 |
1998.12.16 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
KIM KI BUM;YOON TAE SIK;KWON JANG YEON |
分类号 |
H01L29/06;H01L21/20;H01L21/82;H01L29/66;(IPC1-7):H01L21/00 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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