| 摘要 |
PROBLEM TO BE SOLVED: To obtain a new sulfonyldiazomethane compound excellent in solubility, preservation stability and coatability and useful for a photic acid generating agent suitable for a chemical amplification-type resist material excellent especially in resolution and pattern profile shape and hardly causing foreign matter after development and delamination. SOLUTION: This new compound is represented by formula I [R1 is a (substituted) 1-10C alkyl or a (substituted) 6-14C aryl; R2 is a 1-6C alkyl; G is SO2 or CO; R3 is a (substituted) 1-10C alkyl or a (substituted) 6-14C aryl; p is 0 to 4; q is 1 to 5; 1<=p+q<=5; n is 1 or 2; m is 0 or 1; n+m=2], e.g. bis(4- methylsulfonyloxyphenylsulfonyl)diazomethane. The compound of formula I is obtained by employing a compound of formula II and a compound of formula III (X is a halogen) as starting substances and diazotizing a compound of formula IV, obtained via an intermediate compound, with p-toluenesulfonyl azide, p-dodecylbenzenesulfonyl azide or the like under a basic condition. |
