发明名称 OBSERVING METHOD THROUGH USE OF POSITRON REEMISSION MICROSCOPE AND POSITRON BEAM
摘要 <p>PROBLEM TO BE SOLVED: To observe a material of a positive work function to positrons by holding a sample at the incident location of a positron beam, generating an electric field in a pace close to the sample, and accelerating and observing positrons reemitted from the sample. SOLUTION: A sample 10 of a positive work function to positrons held at a sample holding base 3 is irradiated with a positron beam 2 emitted from a positron beam source 1, and an electron lens 5 and screen 7 are arranged on the downstream side of the sample 10. The sample 10 is brought into a high potential side by a high voltage power source 8 to generate an electric field toward the screen 7. Then when the electric field is strengthened, an apparent work function is reduced and a distance is shortened. A potential barrier in the vicinity of the surfaces of the sample 10 is lowered and thinned when viewed from the positrons, and positrons 4 inside the sample 10 are reemitted by the tunnel effect when the potential barrier is thinned. As a beam of the reemitted positrons 4 is enlarged and projected onto the screen 7 by the electron lens 5, it becomes possible to obtain information on impurities, etc., in the surfaces from the projected images.</p>
申请公布号 JP2001056307(A) 申请公布日期 2001.02.27
申请号 JP19990232539 申请日期 1999.08.19
申请人 SUMITOMO HEAVY IND LTD 发明人 HIROSE MASAFUMI
分类号 H01J37/26;G01N23/04;G01N23/225;G21H5/00;G21K5/04;H01J37/27;(IPC1-7):G01N23/225 主分类号 H01J37/26
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