发明名称 METHOD AND DEVICE FOR SUPPLYING PROCESS LIQUID
摘要 PROBLEM TO BE SOLVED: To discharge a developer liquid adjusted to a prescribed temperature without discharging a large amount of developer liquid, even if a long waiting time exists before the next discharge, related to a developer liquid supply method where a flow path is long for a developer liquid coming out of a temperature adjuster to reach a discharge device. SOLUTION: A vessel 4 containing a developer liquid is connected to a discharge device 3, using pipings 5 and 6 via a three-way valve 7. The three-way valve 7 is connected to a vessel 4 using branch pipe 8. A temperature adjuster 9 is provided near the vessel 4 of the piping 5. The developer liquid is supplied from the vessel 4 to the piping 5 at all times, and the developer liquid passing through the temperature adjuster 9 is always made to be present in the piping 5. When no developer liquid is discharged from the discharge device 3, the three-way valve 7 is adjusted so that the developer liquid which is adjusted for temperature is directed toward the branch pipe 8 from the piping 5 and then returned to the vessel 4. When the developer liquid is discharged, the developer liquid which is adjusted for temperature is directed from the piping 5 to a main pipe 6.
申请公布号 JP2001052980(A) 申请公布日期 2001.02.23
申请号 JP19990222939 申请日期 1999.08.05
申请人 ASAHI KASEI MICROSYSTEMS KK 发明人 KAMISHIRO KENZO
分类号 H01L21/027;G03F7/30;(IPC1-7):H01L21/027 主分类号 H01L21/027
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