发明名称 |
ELECTRON GUN, ELECTRON OPTICAL SYSTEM, AND ELECTRON BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an electron gun capable of adjusting both the position and diameter of a cross-over to the desired values. SOLUTION: A primary electron beam 28 emitted by a cathode 1 is released in widening, but constricted near between a Wehnelt 2 and first anode 3 under influence of a negative suppression voltage impressed on the Wehnelt 2 so that a first cross-over 29 is formed. The electron beam 28 is again constricted by regulating the voltages of a second anode 4 and a third anode 5 so that a second cross-over 30 is formed, which is located at the position of a gun aperture 6, and also it is possible to adjust the size of the second cross-over 30.
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申请公布号 |
JP2001052639(A) |
申请公布日期 |
2001.02.23 |
申请号 |
JP19990229454 |
申请日期 |
1999.08.13 |
申请人 |
NIKON CORP |
发明人 |
KANEMATSU ERIKA;KIHARA NAOTO;NISHIMURA HIROSHI |
分类号 |
H01J37/063;H01J37/06;H01J37/29;(IPC1-7):H01J37/063 |
主分类号 |
H01J37/063 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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