INK JET HEAD, FABRICATION THEREOF, AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To form a highly accurate nonparallel gap. SOLUTION: A photoresist layer 33 is formed on a silicon substrate 31 serving as an electrode substrate and exposed through a photomask 34 having a pattern 34a of different light transmittance and then developed to form a recess 35 having shape corresponding to that of a gap between a diaphragm and an electrode. Subsequently, the photoresist layer 33 having the recess 35 is used as a mask for etching the silicon substrate 31 to form a recess 14.