| 摘要 |
PROBLEM TO BE SOLVED: To provide a means, by which ozone can be safely reduced to at most tens ppb level at a low cost and also gaseous impurities harmful to the production of a semiconductor device are not generated as a by-product. SOLUTION: In the advanced cleaning device 1, a circulating path of air is formed to circulate and supply clean air into a comparted space 10. A blowing means 15, a filter 17 with high performance and an ozone decomposition filter 16 carried with manganese oxide are equipped in the circulating path. Air, in which a clean state free from dust is made by the filter 17 with high performance and concentration of ozone is reduced to at most several tens ppb by the ozone decomposition filter 16, is circulated and supplied into the comparted space 10. Further, a by-product, which gives adverse effect to a product, such as gaseous acidic impurities, gaseous basic impurities or gaseous organic impurities is not generated from manganese oxide carried on the ozone decomposition filter 16.
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