发明名称 METHOD AND APPARATUS FOR CONTROL OF FLUID WITHIN SUBSTRATE PROCESSING TANK
摘要 PROBLEM TO BE SOLVED: To improve control of the temperatures and concentrations of chemicals within a substrate processing tank by bleeding a predetermined amount of fluid from the tank and flowing a predetermined amount of fluid into the tank if the level is between predetermined upper and lower levels. SOLUTION: A controller 61 checks whether or not a predetermined processing time period has elapsed, and if the predetermined time period has elapsed, checks the level of fluid within an overflow dam 15 to determine that the level is high, low, or normal based on values detected by a high fluid level detector 17 and a low fluid level detector 19. Thereafter, if the level of the fluid is between the values indicated by the detectors 17 and 19, the controller 61 opens a flow rate limiting auxiliary device 59 to bleed a predetermined amount of fluid from a tank 11, and at the same time, a valve 53 is opened to replenish the tank 11 with a predetermined amount of chemistry.
申请公布号 JP2001044163(A) 申请公布日期 2001.02.16
申请号 JP20000164936 申请日期 2000.06.01
申请人 APPLIED MATERIALS INC 发明人 LERNER ALEXANDER;BROWN BRIAN J;BORIS FISHKIN;JONATHAN S FRANKEL
分类号 F17D3/01;B08B3/00;B08B3/12;G05D9/12;G05D21/00;G05D21/02;G05D23/00;G05D23/19;G05D27/02;H01L21/00;H01L21/304;(IPC1-7):H01L21/304 主分类号 F17D3/01
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