FLUE GAS TREATMENT SYSTEM

摘要

PURPOSE: Disclosed is a control system for the toxic flue gas from the wafer fabrication. A subsidiary scrubber is devised as another treatment system during change of main scrubber, which the exhausted gas commonly erodes wafer-manufacturing utility due to its emission to atmosphere without treatment. According to this method, the devised scrubber plays an assistant and the same role as main scrubber timely even the canister of main scrubber is changed, thereby improving the flue gas control. CONSTITUTION: The flue gas treatment system comprises the following parts: a cylindrical canister (210) shaped narrowly toward the inlet; the first resin (230) located at the lower of the canister; the first gas line (220) and the second gas line (240); a sensor (270) for detecting pressure in the second gas line for monitoring the changing time of the first resin; the third gas line (260) playing an assistant role when replacing exhausted first resin with new one. Whereas the first valve (220) is closed in case of replacing exhausted canister with new one, the second valve (298) is opened to divert flue gas to the third gas line (250) that is connected with the second resin (260).