| 摘要 |
<p>An echelon diffraction grating comprising a substrate and, formed on the surface thereof, an organopolysiloxane film having a maximum thickness of 1 νm to 1 mm, the organopolysiloxane film having, formed thereon, a plurality of steps of a specific width within the range of 1 νm to 500 νm and of a specific height within the range of 5 νm to 500 νm, wherein the above organopolysiloxane film comprises dimethyl siloxane and phenyl (or substituted phenyl) siloxane as main components. The Echelon diffraction grating can be produced at a low cost and is excellent in thermal resistance. An optical wave guide which has high thermal resistance, is reduced in the absorption at a communication wavelength in the near-infrared region, and thus exhibits satisfactory reliability and satisfactorily low loss in the optical communication band is also provided.</p> |
