| 摘要 |
In a pneumatically driven liquid supply apparatus comprising a circulation pump 26 or constant-volume pump 34 for supplying a washing liquid or chemical to a washing tank 20 for semiconductor wafers used during the fabrication of semiconductor devices; an electromagnetic switching valve 51 and a pressure regulator 52 that configure an air-pressure adjustment means 50 are connected to an air source 60; and air supply pipelines 41a, 41b, 41d, and 41e are each connected to the air-pressure adjustment means 50, the circulation pump 26 and the constant-volume pump 34. A leakage sensor 70 is interposed within each of the air supply pipelines 41a, 41b, 41d, and 41e between the air-pressure adjustment means 50 and the circulation pump 26 or constant-volume pump 34, so that any liquid that flows backward through the circulation pump 26 or the constant-volume pump 34 and into the air supply pipeline 41a, 41b, 41d, or 41e is detected by the leakage sensor 70. This makes it possible to prevent damage or halting of the functions of the air-pressure adjustment means due to liquid flowing into the air supply pipelines via one of the pumps.
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