发明名称 MANUFACTURE OF VERTICAL SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a vertical semiconductor device having improved high frequency characteristics by reducing the base area, relative to the collector. SOLUTION: Before a step of forming base electrodes 21a, 21e, emitter electrodes 21b, 21f and collector electrodes 21c, 21g, a step of forming base extraction structures 16, 16a, emitter extraction structures 17, 17a and collector extraction structures 18 is executed as a separate step. This makes it possible to reduce the area of the base 9, relative to the collector 3 by 50%, compared with that in prior art. Thus the junction capacitance between the base and the collector can be reduced to improve the high frequency characteristics.
申请公布号 JP2001035928(A) 申请公布日期 2001.02.09
申请号 JP19990205384 申请日期 1999.07.19
申请人 NEC CORP 发明人 KASAHARA TOMOKAZU
分类号 H01L29/73;H01L21/331;H01L21/8228;H01L27/082;H01L29/732;(IPC1-7):H01L21/822 主分类号 H01L29/73
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