| 摘要 |
<p>An ion beam source (10) which includes a cathode section (26) having a reactive material (27) that upon reaction with a reactive gas forms an insulating thin film on the cathode surface that provides an additional source of electrons for the ion beam source. These enhanced electron emitting surfaces reduce the erosion of component part in the ion source (10) while increasing the rate and quality of the film deposited on the substrate by increasing the supply of electrons. In another embodiment, electron emitters located outside of the ion beam source have cathode sections that comprise enhanced electron emitting surfaces to provide electron flow to the ion beam.</p> |
