Preparation of samples of synthetic particles e.g. for analytical scanning electron or optical microscopy involves depositing material on oxide-coated silicon wafer structurized as required, removing excess to leave islands and separation

摘要

Preparation of samples of synthetic particles (I) comprises transferring the desired particle distribution to an oxide-coated silicon wafer by photolithography; physical vapor deposition of a thin film of (I) material; lifting off excess material, so that (I) remain as islands on the surface of the wafer; dividing the wafer into individual samples; and fixing these to a scanning electron microscope sample holder with a suitable material.