发明名称 |
Method to accurately determine classification codes for defects during semiconductor manufacturing |
摘要 |
A method of determining classification codes for defects occurring in semiconductor processes comparing images of defects from a first selected wafer with images of defects in a first image reference library. The images in the first image reference library are updated from a master image reference library. The images in the master image reference library are the best images of defect types. The images in the master image reference library are in a format readable by all review stations utilized to review the images of the defect.
|
申请公布号 |
US6185511(B1) |
申请公布日期 |
2001.02.06 |
申请号 |
US19970979629 |
申请日期 |
1997.11.28 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
STEFFAN PAUL J.;CHEN MING CHUN |
分类号 |
G06F19/00;G06T7/00;H01L21/66;(IPC1-7):G06F19/00 |
主分类号 |
G06F19/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|