| 摘要 |
A method for manufacturing a liquid crystal display device on a substrate including the steps of forming a gate electrode, a gate line, a gate pad, a source pad, a first gate shorting bar, and a first source shorting bar using a first metal; forming a gate insulation layer, a semiconductor layer, and a doped semiconductor layer by sequentially depositing an insulation material, an intrinsic semiconductor material, and a doped semiconductor material, respectively; and forming a source electrode, a source line, a drain electrode, a second gate shorting bar, and a second source shorting bar using a second metal.
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