发明名称 |
PHASE-SHIFTING POINT DIFFRACTION INTERFEROMETER FOCUS-AID ENHANCED MASK |
摘要 |
A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.
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申请公布号 |
WO0107885(A2) |
申请公布日期 |
2001.02.01 |
申请号 |
WO2000US17563 |
申请日期 |
2000.06.26 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA;NAULLEAU, PATRICK |
发明人 |
NAULLEAU, PATRICK |
分类号 |
G01B9/02;G03F7/20;G03F9/00;(IPC1-7):G01M/ |
主分类号 |
G01B9/02 |
代理机构 |
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地址 |
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