发明名称 |
Holder assembly system and method in an emitted energy system for photolithography |
摘要 |
An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).
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申请公布号 |
US6180952(B1) |
申请公布日期 |
2001.01.30 |
申请号 |
US19980055035 |
申请日期 |
1998.04.03 |
申请人 |
ADVANCED ENERGY SYSTEMS, INC. |
发明人 |
HAAS EDWIN G.;PEACOCK MICHAEL A.;GUTOWSKI ROBERT M. |
分类号 |
G03F7/20;H05G2/00;(IPC1-7):H05H1/34 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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