发明名称 Holder assembly system and method in an emitted energy system for photolithography
摘要 An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).
申请公布号 US6180952(B1) 申请公布日期 2001.01.30
申请号 US19980055035 申请日期 1998.04.03
申请人 ADVANCED ENERGY SYSTEMS, INC. 发明人 HAAS EDWIN G.;PEACOCK MICHAEL A.;GUTOWSKI ROBERT M.
分类号 G03F7/20;H05G2/00;(IPC1-7):H05H1/34 主分类号 G03F7/20
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