| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a diffraction grating having very fine period. SOLUTION: A first resist layer 21 which can be removed by etching and a second photosensitive resist layer 22 in which only a portion irradiated by light irradiation or a non-irradiation portion is soluble in a developing solvent are formed in order on a base material 11, and near-field light 27 is applied to the second resist layer 22 by a means 24 for generating near-field light 27 of a diffraction grating pattern on receiving exposure light L. Subsequently, the second resist layer 22 is developed to form a diffraction grating pattern on the second resist layer 22, and with the pattern as an etching mask, the first resist layer 21 is etched to form a diffraction grating pattern composed of these resist layers 21, 22. Further, with these resist layers 21, 22 as an etching mask, the base material 11 is etched to form a diffraction grating on the base material 11. |
