发明名称 MANUFACTURE OF OPTICAL WAVEGUIDE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To easily and surely manufacture an optical waveguide substrate of low loss, free from deformation of a core pattern and reduced in warpage. SOLUTION: This manufacturing method is a method for manufacturing an embedded optical waveguide substrate. In the method, after a recessed groove 12 in response to a pattern of a desirable waveguide device is formed preliminarily in a silicon substrate 11, the silicon substrate 11 is oxidized by thermal oxidation to form a quartz layer in a periphery of the pattern, a quartz glass layer doped with an impurity having a refractive index larger than that of the peripheral quartz layer is embedded thereafter in the recessed groove 12, a surface of the silicon substrate 11 is polished to be made flat, then a glass layer having a refractive index lower than that of the quartz glass layer having the large refractive index hereinbefore is formed in the flat plane, and light is propagated to the glass layer having the large refractive index embedded in the recessed groove 12.
申请公布号 JP2001021744(A) 申请公布日期 2001.01.26
申请号 JP19990193593 申请日期 1999.07.07
申请人 SHIN ETSU CHEM CO LTD 发明人 MAKIKAWA SHINJI;KONISHI SHIGERU;EJIMA MASAKI
分类号 G02B6/13;G02B6/12;G02B6/122;G02B6/132;G02B6/136;(IPC1-7):G02B6/13 主分类号 G02B6/13
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