MANUFACTURE FOR OPTOELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technology in which the manufacturing cost for an optoelectronic device is reduced. SOLUTION: The manufacturing cost is reduced by reducing a required number of patterning as much as possible by a manufacturing method for a TFT which forms an optoelectronic device. Specifically, impurity elements are added into an active layer by using a gate wiring as a mask. After that, a member which is able to become a mask is formed on the side wall of the gate wiring while adding the impurities without a patterning step, and the impurity elements are added again. By the means an LDD region can be formed without increasing the patterning number.