| 摘要 |
PROBLEM TO BE SOLVED: To measure the thickness of a thin film stably without being affected by partial inclination and vibration of a substrate. SOLUTION: This thickness measuring apparatus of a thin film includes a light source 1, a branching type optical fiber 2 which introduces a light from the light source 1 to a plurality of portions (two portions in this case) and receives reflected lights from a substrate 3 at the respective portions, a light limiting shutter 4 which cuts off selectively incident lights to be introduced to the plurality of portions of the substrate 3 and a plurality of reflected lights of the substrate 3, a spectroscope 5 which resolves the reflected light introduced by the optical fiber 2 in light intensity of each wavelength, and a computer 6 which analyzes the light intensity of each wavelength and calculates the thickness of a thin film. A halogen lamp having a wavelength region (400-850 nm) near to, e.g. a visible light wavelength region (400-800 nm) is used as the light source 1. Another lamp may be installed in the same light source chamber as the halogen lamp or in another light source chamber.
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