发明名称 |
Removal of reticle effect on critical dimension by reticle rotation |
摘要 |
A method (200) of characterizing a lithographic printer includes the steps of printing a first and second pattern (202, 228) on substrates (214) using a reticle (220) having a first and second orientation. The method (200) further includes measuring a critical dimension of the first and second pattens at two points (230, 234) and determining an imaging system component of the critical dimension of the patterns at the two points (236). The method (200) may be further expanded to encompass substantially all the points within the image field.
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申请公布号 |
US6178256(B1) |
申请公布日期 |
2001.01.23 |
申请号 |
US19980201937 |
申请日期 |
1998.12.01 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
NGUYEN KHANH B.;ACKMANN PAUL W.;BROWN STUART |
分类号 |
G03F7/20;(IPC1-7):G06K9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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