| 摘要 |
PROBLEM TO BE SOLVED: To prevent deterioration of exposure precision due to aberration of a projection optical system by performing exposure after correcting the error when variation of temperature of the projection optical system exceeds the predetermined threshold. SOLUTION: For performing exposure, the temperature of a projection optical system PL measured by a temperature sensor TS is observed by a lens control device LC. When the variation of temperature of the projection optical system PL exceeds the threshold, the main control apparatus C measures the nonlinear magnification, wavefront aberration, focal points or curvature of field of the projection optical system PL by using a projection magnification measuring system PM, a focal point measuring system or the like. Namely, the error of nonlinear magnification is corrected by driving a part of lenses in the projection optical system PL, change of pressure or the like and the curvature of field is corrected by driving the wafer stage WST in the direction Z (vertical direction) by controlling the driving mechanism to the measured correction position. The focal point is corrected by moving the wafer stage WST to the focusing position.
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