发明名称 ELECTRODE STRUCTURE OF P-TYPE GROUP III NITRIDE SEMICONDUCTOR LAYER AND METHOD FOR FORMING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an electrode structure formed on a P-type group III nitride semiconductor layer, which is stable and has a low resistance, and a high adhesive strength. SOLUTION: An electrode structure on a P-type group III nitride semiconductor layer includes a first, a second, and a third electrode layers, 102, 103, and 104, where the first electrode layer 102 contains at least one kind selected out of a first metal group composed of Ti, Hf, Zr, V, Nb, Ta, Cr, W and Sc, the second electrode layer 103 contains at least one kind selected out of a second metal group composed of Ni, Pd, and Co, and the third electrode layer 104 contains Au.
申请公布号 JP2001015852(A) 申请公布日期 2001.01.19
申请号 JP20000125121 申请日期 2000.04.26
申请人 SHARP CORP 发明人 TAKATANI KUNIHIRO
分类号 H01L21/28;H01L29/41;H01L33/06;H01L33/32;H01L33/40;H01S5/042;H01S5/323;H01S5/343 主分类号 H01L21/28
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