RADIO FREQUENCY POWER SOURCE FOR GENERATING AN INDUCTIVELY COUPLED PLASMA
摘要
A system for converting DC power (22) into an RF electromagnetic field in a processing chamber, the system being composed of: a coil (16) constructed to surround the processing chamber; and an RF power generator (20) including a free-running oscillator (26) having a DC power input and an RF power output, the power output connected to a load impedance which includes the coil for supplying RF current to the coil at a frequency which is dependent on the load impedance.
申请公布号
WO0105020(A1)
申请公布日期
2001.01.18
申请号
WO2000US18930
申请日期
2000.07.12
申请人
TOKYO ELECTRON LIMITED;JOHNSON, WAYNE, L.;WEST, LEONARD, G.