发明名称 RADIO FREQUENCY POWER SOURCE FOR GENERATING AN INDUCTIVELY COUPLED PLASMA
摘要 A system for converting DC power (22) into an RF electromagnetic field in a processing chamber, the system being composed of: a coil (16) constructed to surround the processing chamber; and an RF power generator (20) including a free-running oscillator (26) having a DC power input and an RF power output, the power output connected to a load impedance which includes the coil for supplying RF current to the coil at a frequency which is dependent on the load impedance.
申请公布号 WO0105020(A1) 申请公布日期 2001.01.18
申请号 WO2000US18930 申请日期 2000.07.12
申请人 TOKYO ELECTRON LIMITED;JOHNSON, WAYNE, L.;WEST, LEONARD, G. 发明人 JOHNSON, WAYNE, L.;WEST, LEONARD, G.
分类号 H05H1/46;C23C16/507;H01J37/32;H01L21/205;H01L21/3065;H02M7/44;H02M7/533;(IPC1-7):H02M1/00 主分类号 H05H1/46
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