发明名称 IMAGE SENSOR HAVING OPTICALLY DESIGNED LAYER FOR IMPROVING OPTICAL TRANSMISSIVITY
摘要 PURPOSE: An image sensor having an optically designed layer for improving an optical transmissivity is provided to increase the light transmissivity of insulation layers stacked on a photo diode for increasing the photo sensitivity of a CMOS image sensor, thereby improving the resolution and performance of the CMOS image sensor. CONSTITUTION: An image sensor having an optically designed layer for improving an optical transmissivity includes a photosensitive element, at least one delectric layer stacked on the photosensitive element, a passivation layer, and an optically designed optical layer formed on the delectric layer for improving the light transmissivity of the delectric layer, wherein the optical layer has the index of refraction root times of the delectric layer, and the thickness of a quarter-wave optical thickness(QWOT) of a short wavelength band.
申请公布号 KR20010004325(A) 申请公布日期 2001.01.15
申请号 KR19990024950 申请日期 1999.06.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, GI NAM
分类号 H01L27/14;G01J1/02;H01L27/146;H01L31/10;H04N5/335;H04N5/369;H04N5/374;(IPC1-7):G01J1/02 主分类号 H01L27/14
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