| 摘要 |
PROBLEM TO BE SOLVED: To set a cumulative exposure amount on a sensitized material to be a target exposure amount, even when the sensitivity of the sensitized material is raised by changing the light amount distribution of lighting light at a Fourier transform plane to the pattern formation plane of a mask, and controlling the exposure amount to the substrate according to the light-amount distribution after the change. SOLUTION: For this projection aligner, a mask 12 and a substrate 5 are moved relative to a lighting light for scan exposure with the substrate 5. A distribution changing means 41 changing the light amount distribution of the lighting light at a Fourier transform plane relative to the pattern formation plane of the mask 12. An exposure amount control means 25 controls the exposure amount to the substrate 5, according to the light amount distribution after change by the distribution changing means 41. A normal circular opening, an opening for a deformed light source which is divided into four sections around an optical axis, and an annular opening, etc., are formed at a variable stop 41 which works as a distribution changing means. The exposure amount control device 25 sets the rotational angle of the variable opening stop 41 via a drive motor 42. |
