| 摘要 |
PROBLEM TO BE SOLVED: To provide a development processing method which is capable of suppressing the generation of a hardly insolubilized layer of resist at the time of rinsing after shaking off a developer and a development processing device therefor. SOLUTION: At the time of development of exposure patterns after exposure of a resist film formed on a substrate W to prescribed patterns, the developer is applied on the resist film after the exposure of the substrate W and the development is progressed by holding the applied developer still to effect the development processing, following which a rinsing liquid is supplied onto the substrate W to rinse the substrate. The developer from a developer discharge nozzle 123 and the rinsing liquid from a rinsing liquid discharge nozzle 122 are supplied onto the substrate W to rinse the substrate in the initial stage of the rinsing. |
