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发明名称
Process for the formation of a collar oxide in a trench in a semiconductor substrate
摘要
申请公布号
EP0933804(A3)
申请公布日期
2001.01.10
申请号
EP19980310674
申请日期
1998.12.23
申请人
INTERNATIONAL BUSINESS MACHINES;SIEMENS AKTIENGESELLSCHAFT
发明人
NAEEM, MUNIR D.;SENDELBACH, MATTHEW J.;WANG, TING-HAO
分类号
H01L21/302;H01L21/3065;H01L21/334;H01L21/8242;H01L27/108;(IPC1-7):H01L21/311;H01L21/824
主分类号
H01L21/302
代理机构
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