| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating solution for forming a transparent electroconductive film that can use over a wide range of substrate plates, can form a transparent electroconductive film even by low-temperature firing at a level of about 200 deg.C and can be readily formulated to a wide range of concentration that can meet a wide variety of purposes and provide a method for forming the transparent electroconductive film. SOLUTION: This coating solution for forming a transparent electroconductive film is prepared by dissolving indium formate, an organotin compound and an organic amine, as essential components, and a nitro compound, when necessary, in a solvent. The substrate plate is coated with this coating solution on its surface(s) and heat-treated to form the objective transparent electroconductive film.
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