发明名称 ADHESIVE MASS FOR DEPILATION OF GIVING REDUCED IRRITATION TO SKIN
摘要 PROBLEM TO BE SOLVED: To obtain an adhesive mass for depilation which holds sufficient depilation effect and possesses an effect of easing irritation on the skin by formulating an agent for easing irritation to the skin containing glycyrrhetinic acid, a glycyrrhetinic acid derivative and/or a mixture of glycyrrhetinic acid and stearic acid to an adhesive mass. SOLUTION: This adhesive mass for depilation is obtained by including (A) glycyrrhetinic acid, (B) a glycyrrhetinic acid derivative (e.g. stearyl glycyrrhetinate or the like) and/or (C) a mixture (preferable mixed weight ratio of 1:1 to 1:3) of glycyrrhetinic acid and stearic acid as an agent for easing irritation to the skin in an adhesive mass. It is favorable that the adhesive mass includes (i) an A-B-A type styrene-diene block copolymer and (ii) an adhesion-giving resin, (iii) a liquid rubber and (iv) a compatibilizer in proportions of 100-400 pts.wt., 1-50 pts.wt. and 5-50 pts.wt., respectively, based on 100 pts.wt. of the copolymer as major components. The agent for easing irritation to the skin is preferably formulated in a proportion of 0.005-1.50 pts.wt. based on 100 pts.wt. of the component i.
申请公布号 JP2001002539(A) 申请公布日期 2001.01.09
申请号 JP19990172263 申请日期 1999.06.18
申请人 KYOWA LTD 发明人 SENOO AKIRA;TANIGUCHI MASAHARU;HIRAKAWA YONEO
分类号 A61K8/00;A61K8/36;A61K8/90;A61Q9/04;C08K5/09;C08L53/02;C09J153/02;(IPC1-7):A61K7/155 主分类号 A61K8/00
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