发明名称 FILM FORMING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent adherence of deposits, and deposition of a large volume of deposits by providing at least a substantially thin-walled upper end portion of a cylindrical upper part to store an evaporating material which is projected above a base part to be cooled of a hearth with the evaporating material stored therein in a vacuum chamber. SOLUTION: A hearth 41 comprises a box-shaped base part 41b of container shape in which a refrigerant is circulated, and an upper part 41a to stored columnar pellet-like evaporating material to be fed on a batch basis. Preferably, the wall thickness (t) of at least an upper end portion 41c of the upper part 41a is >=1 mm to <=5 mm, the angleθ1 of an outer wall surface 41e is >=0 deg. to <=20 deg., and the angleθ2 of an inner surface 41d of the upper end portion 41c is >=0 deg. to <=45 deg.. Since most of the upper part 41a is constantly located within the irradiation range of a plasma beam 300, deposits 200' to adversely affect the beam irradiation are re-evaporated and hardly deposited.
申请公布号 JP2001003158(A) 申请公布日期 2001.01.09
申请号 JP19990174154 申请日期 1999.06.21
申请人 SUMITOMO HEAVY IND LTD 发明人 IIO ITSUSHI;MIYOSHI AKIRA;YOSHII AKIHIKO
分类号 C23C14/24;C23C14/28;(IPC1-7):C23C14/24 主分类号 C23C14/24
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