发明名称 |
Apparatus and method for forming three-dimensional objects in stereolithography utilizing a laser exposure system with a diode pumped frequency-multiplied solid state laser |
摘要 |
Embodiments of the instant invention are directed to laser exposure system that employs a pulsed solid state laser to provide a reactive response wavelength and a pulse repetition rate specifically optimized for application to solidification of a liquid photopolymer in a stereolithographic process. The solid state laser employs two second harmonic crystals for generating an emission wavelength at about 320-345 nm and a pulse repetition rate, wherein the pulse repetition rate is selected such that a pulse separation at the target surface results which is less than a diameter of the beam when the beam is being scanned at a desired velocity and an average exposure deposited by the beam is equal to a desired amount.
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申请公布号 |
US6172996(B1) |
申请公布日期 |
2001.01.09 |
申请号 |
US19990435326 |
申请日期 |
1999.11.05 |
申请人 |
3D SYSTEMS, INC. |
发明人 |
PARTANEN JOUNI P.;HUG WILLIAM F. |
分类号 |
B29C67/00;(IPC1-7):B29C35/08 |
主分类号 |
B29C67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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