METHOD FOR IMPROVING ALIGNMENT PRECISION

摘要

PURPOSE: A method for improving alignment precision is provided to perform an alignment regarding a plurality of different preceding layers in an exposure apparatus without an additional photo process regarding a sample wafer. CONSTITUTION: Respective coordinate values of alignment marks generated in a plurality of different preceding layers are measured during an exposure process in an exposure apparatus. Alignment correction values are calculated by converting the respective measurement values of the alignment marks, and an alignment process is performed regarding the plurality of different preceding layers.