| 发明名称 |
Method for rough-etching a semiconductor surface |
| 摘要 |
The invention refers to a method for etching a semiconductor surface, wherein the surface is subject to a wet treatment in several process steps.
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| 申请公布号 |
US6169038(B1) |
申请公布日期 |
2001.01.02 |
| 申请号 |
US19990251288 |
申请日期 |
1999.02.17 |
| 申请人 |
SEZ SEMICONDUCTOR-EQUIPMENT ZUBEHOR FUR DIE HALBLEITERFERTIGUNG AG |
发明人 |
KRUWINUS HANS-JUERGEN;KOVACS FREDERIC |
| 分类号 |
H01L21/304;H01L21/306;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/304 |
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