| 摘要 |
The ionic source is used in ionic technologies.It produces an ionic beam of positive ions of all metals and semiconductors in solid aggregate state with sufficient density and magnitude of the ionic current for technological applications. 100% ionization of the working substance is produced with minumum energy costs, full control of the consumption of the ionic beam and facility for its fixation into a small-diameter spot. The ionic source has an exceptionally long operational time and high reliability. It consists of an ionic emitter with field evaporation (1) supplied with a focusing (3), acceleration (5) and delaying (6) electrode, system of neutralization (9) of the ionic beam, source of preheating voltage (10) for the ionic emitter with field evaporation (1), DC supply source (8) and DC sources of focusing (4), acceleration (2) and delaying (7) voltage. 3 claims, 5 figures
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