| 摘要 |
<p>A plasma treatment apparatus for a workpiece includes a metal electrode (11) , a capillary dielectric electrode (12) having first and second sides and coupled to the metal electrode through the first side, wherein the capillary dielectric electrode has at least one capillary, a shield body (13) surrounding the metal electrode and the first side of the capillary dielectr ic electrode, wherein the shield body has first and second end portions, and a gas supplier (14) provinding gas to the metal electrode (11).</p> |
