发明名称 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
摘要 |
An inductively coupled RF plasma reactor for processing semiconductor wafer includes a reactor chamber having a side wall (10) and a semiconductor ceiling (12), a wafer pedestal (14) for supporting the wafer (16) in the chamber, an RF power source (28), apparatus (22, 24) for introducing a processing gas into the reactor chamber, and a coil inductor (42) adjacent the reactor chamber connected to the RF power source, the coil inductor including (a) a side section (44) facing a portion of the side wall and including a bottom winding (44b) and a top winding (42a), the top winding being at a height corresponding at least approximately to a top height of the ceiling, and (b) a top section (46) extending radially inwardly from the top winding of the side section so as to overlie at least a substantial portion of the ceiling. Another RF power source (28d, 30d) may be applied to the semiconductor ceiling (12) so that the ceiling functions as a semiconductor window electrode. <IMAGE> |
申请公布号 |
EP0820087(A3) |
申请公布日期 |
2000.12.27 |
申请号 |
EP19970305211 |
申请日期 |
1997.07.14 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
YIN, GERALD ZHEYAO;MA, DIANA XIABLING;SALZMAN, PHILIP;LOEWENHARDT, PETER K.;ZHAO, ALLEN;COLLINS, KENNETH |
分类号 |
H01L21/3065;C23C14/24;C23C14/54;C23C16/50;C23F4/00;H01J37/32;H01L21/203;H01L21/205;H01L21/302;H05H1/46 |
主分类号 |
H01L21/3065 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|