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发明名称
Method of forming fine pattern
摘要
申请公布号
EP1058155(A3)
申请公布日期
2000.12.20
申请号
EP20000111662
申请日期
2000.05.31
申请人
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.;ASM JAPAN K.K.
发明人
OKABE, ICHIRO;ARAI, HIROKI
分类号
G03F7/11;G03F7/004;G03F7/09;G03F7/16;H01L21/027;(IPC1-7):G03F7/09
主分类号
G03F7/11
代理机构
代理人
主权项
地址
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