发明名称 SKIN COMPOSITION FOR EXTERNAL USE HAVING ANTISTRESS ACTION
摘要 PROBLEM TO BE SOLVED: To obtain a skin composition for external use having a stress coping action. SOLUTION: This antistress skin composition for external use useful comprises one or more kinds selected from sulfate group-containing mucopolysaccharides and one or more kinds selected from essences of mushrooms of the family Polyporaceae. The composition contains a heparin analog substance as the sulfate group-containing mucopolysaccharide. The composition comprises polypore, fruit body of Ganoderma lucidum, Lampteromyces japonicus, Grifola frondosa, polyporus or Pachyma hoelen as the mushroom of the family Polyporaceae. The composition is a cosmetic.
申请公布号 JP2000351710(A) 申请公布日期 2000.12.19
申请号 JP19990161743 申请日期 1999.06.09
申请人 POLA CHEM IND INC 发明人 TAKATORI MASAHARU
分类号 A61K8/00;A61K8/73;A61K8/97;(IPC1-7):A61K7/00 主分类号 A61K8/00
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