| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical structure having transparency in the far UV region including 193 nm wavelength of ArF excimer laser and also having high dry etching resistance, to permit development with an aqueous alkali devel oping solution without swelling a fine pattern and to enhance resolution by incorporating a compound containing at least a δ-hydroxycarboxylic acid struc ture into a radiation sensitive composition. SOLUTION: A coating film comprising a radiation sensitive composition is formed on a substrate and irradiated with active radiation to form a latent image in the coating film and the latent image is developed with an aqueous alkali developing solution to form the objective pattern. The radiation sensitive composition contains at least a compound containing at least δ- hydroxycarboxylic acid structure represented by the formula. The compound has three ring structures, and in the part irradiated with the active radiation a 6-membered ring is further formed by the lactonization of the δ- hydroxycarboxylic acid structure and high dry etching resistance is ensured. |
