| 摘要 |
PROBLEM TO BE SOLVED: To obtain high smoothness and rigidity, improve a property of increasing hydrophilicity by photo-excitation and the adhering stain-removing properties having a decomposition activity against organic materials and also improve the stain removing activity and durability by forming a photocatalyst film containing a semiconductor oxide and an insulant oxide on the surface of a base. SOLUTION: A photocatalyst film 3 containing a semiconductor oxide 1 such as a titanium oxide and an insulant oxide 2 is formed on the surface of a base 3 to provide the superior adhering stain-removing properties. Namely, a solution containing a titanium alkoxide as a kind of metal alkoxide is used as a film manufacturing raw material, and the solution is provided on the surface of the base 3, and titanium alkoxide is heat decomposed and polymerized (alcohol removing reaction) by the heat on the surface of the base or the heat from the low temperature heat treatment of the base, and a titanium oxide film is formed on the surface of the base, and the film is formed as an adhering stain-removing photocatalyst film of high stain proofness. At this time, the contact angle of water on the surface of the photocatalyst film photo-excited adhering stain removing properties is set larger in the range of 5-30 deg. than the contact angle of water before the photo-excitation. |
