| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to suppress the number of abnormal electric discharges even if a protective film deposition rate is increased by installing plural sputtering targets for forming the protective films in a vacuum chamber and connecting the respective sputtering targets to respective independent power sources. SOLUTION: The plural sputtering targets 14 and plural plasma generating electrodes 15 are installed. The respective sputtering targets 14 and the respective plasma generating electrodes 15 are connected to the respective independent DC power sources 16 and the AC power sources 18. The plasmas generated by respectively independently controlling the respective sputtering targets 14 and the respective plasma generating electrodes 15 are controlled, by which the abnormal electric discharges may be decreased even if the protective film deposition rate is increased and a film 6 is not broken. The sputtering targets or the plasma generating power source are divided and controlled by the respective independent power source, by which the entire making current is dispersed to the respective power sources to make the maximum current of the respective power sources smaller than the current at the time of the independent power source. The abnormal electric discharges are thereby decreased.
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