FABRICATING METHOD OF FIELD EMISSION DISPLAY USING SILICIDATION PROCESS

摘要

PURPOSE: A field emission display manufacturing method using silicide process is provided to make an array vacuum packaging on a glass panel and make a large area flat display panel cheaply by making an emitter tip sharply and forming an emitter tip on the glass panel. CONSTITUTION: A silicon series thin film is formed for emitter on a substrate(401). A mask pattern is formed on the silicon series thin film. The silicon series thin film is etched in a designated thickness in order to form a neck part of an emitter tip, and then the mask pattern is removed. A high melting point metal film is formed for silicide on the silicon series thin film which the neck part of the emitter tip is formed with. The metal film is formed as the silicide film reacting the silicon series thin film and the metal film by heat treatment in order to form the neck part of the emitter tip of the silicon series thin film sharply. A silicide film is removed.