METHOD FOR FORMING A MINUTE ISOLATED HOLE PATTERN

摘要

PURPOSE: A method for forming a single fine hole pattern is provided to form a single fine hole pattern with a high resolution and a high depth of focus by performing a photo-lithography process. CONSTITUTION: The first photoresist(12) is applied on a lower layer. The first exposure process for the first photoresist(12) is performed by using the first reticle forming an auxiliary fine pattern hole around a single fine hole pattern. A thermal process for the first photoresist(12) is performed. The first photoresist(12) is hardened. The second photoresist(22) is applied on the lower layer including the first photoresist(12). A single fin hole pattern(25) is formed by performing the exposure process for the second photoresist(22) using the second reticle.