METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for manufacturing a semiconductor device is provided to simplify manufacturing process, by consecutively forming polymer on a sidewall of a photoresist layer pattern and etching a lower layer under the photoresist layer pattern used as a mask, in the same process chamber. CONSTITUTION: A conductive layer is formed on a semiconductor substrate(11) having a lower structure. An anti-reflecting layer(18) and a photoresist pattern(19) are sequentially formed on the conductive layer. Polymer(20) is formed on a sidewall of the photoresist layer pattern. An in-situ process is performed in the same process chamber to form a pattern by etching the anti-reflecting layer and conductive layer with polymer using as a mask the polymer formed on the photoresist layer pattern and on the sidewall of the photoresist layer pattern.